ProjectsInformation and Communication

Research Overview

Using world-class clean room at NICHe's Fluctuation Free Facility, we are promoting industry-academia collaborative research and development in the semiconductor field based on high-performance image sensors and measurement technologies that we have developed to date. We are developing fundamental technologies and also promoting the development of high-precision semiconductor integrated circuit manufacturing technologies ranging from materials, equipment, processes, measurement and evaluation, devices, circuits, and systems, and are conducting development that will lead to practical application and social implementation, thereby improving the competitiveness of semiconductor and electronics-related companies.

Research Features

With the accelerated spread and development of data and AI applications that contribute to the development of society, it has become extremely important to acquire manufacturing and production technologies of semiconductor integrated circuits. To manufacture large-scale, 3D integrated structures of nanoscale devices, processing precision with atomic-level controllability over the entire surface of large-diameter wafers is required. There, it is necessary to establish high-precision manufacturing technology based on sensing and measurement technologies.

We are focusing on the development of technologies for fluid concentration distribution measurement using wide dynamic range and high temporal resolution image sensors, proximity capacitance measurement using high precision proximity capacitance image sensors, short turn-around-time (TAT) clean process equipment technology to expand the range of applications for beyond 2-nm semiconductors, and high precision process, material and evaluation technologies. We are promoting development at practical level.

Expected Outcomes and Developments

We are constructing a wide dynamic range, high temporal resolution image sensor and sensing system to enable real-time measurement and control of gas and liquid concentration distribution, thereby contributing to higher precision in semiconductor integrated circuit manufacturing equipment and processes. As a participating institution of the Leading-edge Semiconductor Technology Center (LSTC), we are conducting practical research to support short TAT manufacturing of advanced logic semiconductors beyond 2-nm. In addition, we are working to expand horizontally into several fields; namely developing inspection and measurement technologies using high-precision proximity capacitance image sensors to contribute to higher precision in wafer and substrate processes. We are also contributing to the creation of a clean process and a green ecosystem by evaluating components, materials, and devices using our physical analysis, chemical analysis, and electrical property measurement technologies for new materials and structures that are performed with short cycle times.